AE公司将在SEMICON(r) Japan 2007展会上重点展出最新Paramount(tm) RF功率输送系统，另外，Aera(r) AS-92热蒸发系统、Aera EPV100-AW排气压力控制计、Pulsar(TM)大功率DC脉冲调制器等其它先进产品也会同时亮相。

Paramount(TM) RF功率输送系统具有很快的切换速度，能够缩短工艺时间，获得优异的精确性、可重复性和工艺控制性能。Paramount平台的可选脉冲和脉冲同步特性使其具有很宽的脉冲频率范围，而其阻抗测试精度达到了网络分析仪的水平，从而在13.56MHz固定或可变频率获得了前所未有的功率输送精度和控制性能。

Aera EPV100-AW排气压力控制计采用的专利技术使用户可选择“绝对”或压差控制工艺室的排气压力。EPV实现了对排气压力的精确控制，无论环境压力如何变化，都能准确控制氧化膜厚度。凭借其出众的耐用性、可靠性和降低的功率消耗，EPV 可提高产品成品率并减少拥有成本。

Aera AS-92热蒸发系统具有业界领先的可靠性及流动稳定性，可以提高薄膜均匀性及良率。该系统无须持续监控补充压力便可控制蒸发TEOS, SiCl4, HMDS及其他先进材料。

Pulsar大功率DC脉冲调制器具有40kW, 40/40 kW及80kW脉冲选择，可提高工艺质量及均匀性，增加产量与良率。在建筑玻璃镀膜、平板显示器制造、连续卷绕镀膜等应用中，利用Pulsar可以减少污染、溅射及细裂纹的产生。

AE也将展示数款太阳能光伏领域产品，其中包括Cesar(r) 射频能量发生器。

ADVANCED ENERGY(r) TO HIGHLIGHT NEW PARAMOUNT(tm) RF POWER-DELIVERY
SYSTEM AT SEMICON(r) JAPAN 2007

AE(r) also showcasing Aera(r) AS-92 Thermal Vaporizer System and Aera(r)
EPV Exhaust Pressure Controller

HACHIOJI, Japan, Nov. 27, 2007-Advanced Energy(r) Industries, Inc. (NasdaqGM: AEIS) will highlight the new Paramount(tm) RF power-delivery system during SEMICON(r) Japan 2007.? AE(r) will also feature its Aera(r) AS-92 thermal vaporizer system and Aera EPV100-AW exhaust pressure controller, as well as other systems from its advanced product portfolio at the exposition, to be held December 5-7 at the Makuhari Messe in Chiba, Tokyo, Japan.

Semiconductor Applications
AE"s new Paramount RF power system enables faster transitions, shorter steps and reduced process times to achieve unprecedented control, accuracy and repeatability in ever more complex applications.? Precise power delivery and optional RF pulsing allow more accurate process control and uniformity when etching and depositing anti-reflective coatings, hard masks, cap layers and etch-stop layers required by the next-generation nodes.? The Paramount system"s measurement technology and optional ultra-fast frequency tuning enable it to deliver exceptionally precise power at 13.56 MHz fixed or variable frequencies.

Also showcased will be the Aera EPV-100AW exhaust pressure controller. It has a patented technology that enables user selection of either "absolute" or "differential" control of a fab"s exhaust pressure.? The EPV controller enables precise control of exhaust pressure and, thereby, of oxide film thickness-regardless of atmospheric pressure changes, such as weather conditions, house exhaust-pressure fluctuations or altitude. The EPV controller"s superior durability, reliability and reduced power consumption enable improved yield and lower cost of ownership.

FPD Applications
The Aera AS-92 thermal vaporizer system features industry-leading reliability and flow stability, which result in measurably improved film uniformity as well as increased yield system uptime.? The AS-92 enables consistent delivery of vaporized TEOS, SiCl4, HMDS and other precursor materials on a reliable basis, without the need for constantly-monitored refill pressures.? The integrated thermal technology prevents condensation, while a high-temperature MFC controls the vapor delivery with accuracy.? Gas-wetted surfaces are electropolished and ultra-clean.

AE will also feature its Pulsar high-power DC pulsing accessory, which provides improved process quality and uniformity, as well as increased throughput and yield.? With available 40 kW, 40/40 kW, and 80 kW pulsing functions, the Pulsar accessory goes beyond arc handling, actually preventing arcs from occurring.? As a result, the Pulsar accessory reduces contamination, splattering and crazing in such varied applications as residential and architectural glass coating, flat panel display manufacturing, roll-to-roll coating and headlight metallizing.

Solar PV Applications
AE will also display several of its products for solar PV applications,including the Cesar(r) RF generator, a full-featured generator that meets the critical specifications of the solar-cell manufacturing industry.

To learn more about AE"s products during SEMICON Japan, visitwww。advanced-energy。co。jp/SCJ07.html.